The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Jan. 07, 2000
Applicant:
Inventor:
Koji Suzuki, Chiba, JP;
Assignee:
Kawasaki Steel Corporation, Kobe, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; H01L 2/1302 ;
U.S. Cl.
CPC ...
G03F 9/00 ; H01L 2/1302 ;
Abstract
An etching method for use in production of semiconductor devices is disclosed. In the etching method, CBr or its derivative formed in the plasma is deposited on portions of the surface of a substrate to be etched. A sidewall and/or underlying layer protection effect is obtained concurrently with an improved resist selectivity through the function of the high boiling point of the deposit.
Suzuki, Koji. (2002). Etching method for production of semiconductor devices (U.S. Patent No. 6492068). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6492068
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile