The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Apr. 20, 2000
Applicant:
Inventors:
Gordon Lee Graff, West Richland, WA (US);
Mark Edward Gross, Pasco, WA (US);
Ming Kun Shi, Richland, WA (US);
Michael Gene Hall, West Richland, WA (US);
Peter Maclyn Martin, Kennewick, WA (US);
Eric Sidney Mast, Richland, WA (US);
Assignee:
Battelle Memorial Institute, Richland, WA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 1/501 ; B32B 1/800 ; B32B 2/700 ; B32B 2/730 ; B32B 2/732 ;
U.S. Cl.
CPC ...
B32B 1/501 ; B32B 1/800 ; B32B 2/700 ; B32B 2/730 ; B32B 2/732 ;
Abstract
A high temperature substrate having improved properties. The substrate is a polymer substrate having a glass transition temperature greater than about 120° C., and at least one first barrier stack adjacent to the polymer substrate. The barrier stack includes at least one first barrier layer and at least one first polymer layer. A method for making the high temperature substrate with improved properties is also disclosed.