The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Sep. 20, 2001
Laurence M C Lai, Mississauga, CA;
Graphic Packaging Corporation, Golden, CO (US);
Abstract
Corruption of features formed by etching a metal-containing web in a continuous etch process is reduced by distorting the original design or designs of the features to compensate for localized areas subject to excessive etching during the continuous etch process. In the case of a planar speaker diaphragm, for example, the width of the portions of the trace that are in a cross-machine direction is increased to compensate for the higher etching rate caused by the motion through the etch bath. While this causes the modified trace design to appear to be distorted relative to the original trace design, the etched trace resulting from the modified trace design has improved uniformity and greater fidelity to the original trace design than if the original trace design had been used in the continuous etch process.