The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Sep. 09, 1998
Applicant:
Inventors:
Hirofumi Ichinose, Tokyo, JP;
Ippei Sawayama, Machida, JP;
Tsutomu Murakami, Nara, JP;
Masaya Hisamatsu, Kawasaki, JP;
Yukie Ueno, Nara, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23H 1/100 ; C25F 3/00 ; C25F 7/00 ; H05K 3/07 ;
U.S. Cl.
CPC ...
B23H 1/100 ; C25F 3/00 ; C25F 7/00 ; H05K 3/07 ;
Abstract
An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70°. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.