The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2002

Filed:

Oct. 10, 2000
Applicant:
Inventors:

Yuji Horie, Tokyo, JP;

Takabumi Marukawa, Tokyo, JP;

Yoshihiro Tawara, Tokyo, JP;

Kanichi Endo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract

A glass substrate for a magnetic disk has one or both of its surfaces processed by applying a suspension of a specified kind onto the surface to be processed while the substrate is rotated and a polishing tape is pressed and run against the surface to be processed. The suspension includes abrasive particles with average diameter selected according to the purpose of the processing and an aqueous solution containing a reacting liquid capable of causing a solid phase reaction at contact boundary surfaces between the surface of the glass substrate and these abrasive particles. The polishing tape is removed from the glass substrate when the polishing is over but while the tape is still running and the glass substrate is rotating. The supplying of the suspension is thereafter stopped and a washing liquid such as water is applied to the polished surface or surfaces while the substrate is still rotating. Both surfaces of a glass substrate may be polished at the same time.


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