The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Sep. 27, 2000
John L. Nash, Burlington, NC (US);
Lynn M. Pappas, Greensboro, NC (US);
Burlington Industries, Inc., Greensboro, NC (US);
Abstract
Fabrics and methods of making such fabrics whereby no evident pile structure is present in raised pattern areas on the face of the fabric. The construction of the fabric is nonetheless such that the yarns forming the raised pattern areas are more susceptible to napping as compared to the yarns forming the recessed ground regions of the fabric. This fabric construction of selected yarns will thus permit preferential napping of the pattern areas to be achieved (e.g., using conventional napping wires) while the adjacent ground regions of the fabric remain substantially unnapped. Subsequent shearing of the napped pattern areas thereby results in a velvet-like hand being achieved.