The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2002
Filed:
Aug. 01, 2000
Johann Mitrowitsch, Lichtenwald, DE;
Matsushita Display Devices (Germany), GmbH, Esslingen, DE;
Abstract
In the case of shadow masks which are pretensioned vertically and horizontally and the horizontal pretension of which is produced by stretching in the vertical direction, an expensive mask material having a low coefficient of thermal expansion can only be replaced by a less expensive mask material, such as iron, if the tension forces which can be produced for pretensioning the mask in the horizontal direction are markedly higher than the hitherto produced forces. For this purpose, the outer boundaries of the shadow-mask sides which are not connected to the mask frame are implemented such that they have a curved shape and a higher strength. In this way, it is possible to produce in a direction perpendicular to the stretching direction tension forces which are higher than the hitherto produced forces.