The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2002
Filed:
Nov. 16, 2001
Piet J Bolluijt, Dinteloord, NL;
Jasper R. Bouma, Halsteren, NL;
Herve Cartier, Levallois Perret, FR;
Ulrich Hofmann, Gladenbach, DE;
Jan P. H. Keulen, Ossendrecht, NL;
Christiaan Henricus Koevoets, Roosendaal, NL;
Eric Reitjens, LE Bergen op Zoom, NL;
Peter O. Stahl, Ruessselsheim, DE;
Geert Tamboer, Hoogerheide, NL;
Werner Woerhle, Schiltach, DE;
General Electric Company, Pittsfield, MA (US);
Abstract
The above described deficiencies and drawbacks are overcome by the process for making poly(arylene ether)-polyamide compositions which comprise about 10 weight percent (wt %) to about 90 wt % poly(arylene ether), about 90 wt % to about 10 wt % polyamide, about 0.01 wt % to about 10 wt % compatibility modifier, and optionally other additives known in the art. The process comprises several components which can be employed singly or in combination, namely: utilizing resins and additives that are substantially free of gaseous oxygen (air-free; e.g. less than about 1.0 vol % oxygen preferred, and less than about 0.5 vol % oxygen especially preferred, and less than about 0.05 vol % especially preferred); melting and compounding under an atmosphere which is substantially air-free; adding up to 20 wt % of polyamide to the poly(arylene ether) before compounding; when employing an extruder with an atmospheric vent, operating with the atmospheric vent open; and performing the injection molding under an inert atmosphere.