The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2002
Filed:
May. 07, 2001
Applicant:
Inventors:
Kil Sung Lee, Seoul, KR;
Jae Seok Lee, Euiwang-shi, KR;
Seok Jin Kim, Seoul, KR;
Young Ki Lee, Tajeon-shi, KR;
Tu Won Chang, Tajeon-shi, KR;
Assignee:
Cheil Industries, Inc., Kyongsang-Pukdo, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/00 ; C09K 3/14 ;
U.S. Cl.
CPC ...
B24D 3/00 ; C09K 3/14 ;
Abstract
The present invention relates to a polishing composition comprising 30 to 99 wt % of deionized water, 0.1 to 50 wt % of powder of metallic oxide and 0.01 to 20 wt % of cyclic amine. This polishing composition can be used in a chemical mechanical polishing of thin films in integrated circuit manufacturing and has an effect of minimizing the occurrence of microscratches on the thin film after polishing. Thereby it can be applied to the manufacturing process of highly integrated circuits such as Shallow Trench Isolation.