The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2002
Filed:
Dec. 13, 2000
Michael Liehr, Feldatal, DE;
Lothar Schäfer, Meine, DE;
Other;
Abstract
In an apparatus for depositing polycrystalline diamond by plasma technology onto substrates ( ) of large area, having a process chamber ( ) with airlock ( ), a plurality of microwave plasma sources ( , . . . ) arranged in a common plane above the substrates ( ) and extending transversely across the direction of substrate advancement, and gas inlet and gas outlet tubes ( , . . . ) leading into the process chamber ( ) are provided, a plurality of gas inlet and gas outlet tubes distributed over the length of the source are associated with each of the linear sources ( , . . . ), and the outlet openings of the gas inlet tubes being situated each directly above the linear source ( , . . . ), and the openings of the gas outlet tubes ( , . . . ) each in the area between two linear sources ( , . . . ) and in a plane which extends approximately through the core axes ( ) of the linear sources ( , . . . ).