The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Sep. 28, 1999
Kazuya Kitamura, Tenri, JP;
Yukio Kurata, Tenri, JP;
Takeshi Yamaguchi, Sakai, JP;
Tetsuo Ueyama, Nara, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A diffraction grating for generating a plurality of beams includes a plurality of gratings. The plurality of gratings are formed to have an axis of symmetry perpendicular to the direction in which a beam is divided on a surface of diffraction grating and include at least two gratings having different fundamental cycles. The plurality of gratings are formed such that they have an axis of symmetry perpendicular to the direction in which a beam is divided on a surface of the diffraction grating, for generating a plurality of beams. The fundamental cycle increases as a function of the distance from the axis of symmetry, and therefore aberration in the periphery of scattering light may be reduced.