The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
May. 07, 2001
John Chin-Hsiang Lin, Kaohsung, TW;
Vanguard International Semiconductor Corporation, Hsin-Chu, TW;
Abstract
A dynamic mask exposure system includes a support, a source of a beam, and a transmissive dynamic phase-shifting mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines. A control system is connected to supply pixel control signals to the actuator lines of the mask to form a pattern of transparent regions and opaque regions. The beam is directed onto the mask. A pattern detection element is located on the support. The beam passes through the transparent regions and projects a pattern from the mask onto the support or onto the image detection element. Where the image detection element is the target, there are means for providing signals representing the pattern to the control system.