The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2002

Filed:

Nov. 28, 2000
Applicant:
Inventors:

James R. Butler, Houston, TX (US);

Denis Mignon, Braine-l'Alleud, BE;

Assignee:

Fina Technology, Inc., Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 2/66 ; B01J 8/04 ;
U.S. Cl.
CPC ...
C07C 2/66 ; B01J 8/04 ;
Abstract

Vapor phase alkylation of an aromatic substrate in a multi-stage alkylation reaction zone having a plurality of series-connected catalyst beds providing mixing zones between adjacent catalyst beds. An aromatic substrate and a C -C alkylating agent is supplied to an inlet side of a gas phase reaction zone causing vapor phase alkylation of the aromatic substrate as the aromatic substrate and the alkylating agent flow through the reaction zone from one catalyst bed to the next. A quench fluid comprising one or both of the aromatic substrate and the alkylating agent is supplied into the interior of the mixing zone through a plurality of flow paths. One portion of the flow paths is directed upwardly and another portion downwardly within the mixing zone. The quench fluid is supplied to the mixing zone through a plurality of dispersion channels spaced laterally from one another.


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