The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Dec. 19, 2001
Tetsuya Inoue, Chiba, JP;
Masanori Sera, Chiba, JP;
Idemitsu Petrochemical Co., Ltd., Tokyo, JP;
Abstract
A process for producing a styrenic copolymer having a functional group and a syndiotactic configuration is provided. The process comprises bringing a metal compound into interaction with a vinyl compound having a functional group to mask the functional group and copolymerizing the vinyl compound having the masked functional group with a styrenic compound in the presence of a polymerization catalyst comprising (A) a transition metal compound, (B) at least one compound selected from compounds having oxygen and compounds which can form ionic complex compounds by reaction with the transition metal compound and (C) an organometallic compound. A styrenic copolymer which is a random, block or graft copolymer, preferably a random copolymer, of a vinyl compound having a functional group and a styrenic compound and has the repeating units derived from the styrenic compound having the syndiotactic configuration can be produced efficiently. The above styrenic random copolymer exhibits excellent physical properties such as excellent adhesion with various adhesives and excellent compatibility with various rubbers and is advantageously used for various applications as various types of molded articles.