The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Apr. 11, 1994
René Winand, Rixensart, BE;
Stéphane Lucas, Namur, BE;
Pierre Vanden Brande, Brussels, BE;
Alain Weymeersch, Wavre, BE;
Lucien Renard, Seraing, BE;
Recherche et Development du Groupe Cockerill Sambre, Ougree, BE;
Abstract
A process of depositing a coating ( ) onto a substrate ( ) by reactive sputtering in a closed chamber ( ) in the presence of a plasma of a non-reactive gas, and a reactive gas containing the element or elements said coating has to be made of, according to which process use is made of a target ( ) having a surface layer ( ) directed towards the substrate and containing at least one of the elements to be sputter deposited onto this substrate, according to which process the thickness of said surface layer ( ) during the cathode sputtering is controlled by adjusting the concentration of the gases in said closed chamber ( ). The single figure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile