The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2002
Filed:
Aug. 27, 1999
Applicant:
Inventor:
Reto Schöb, Volketswil, CH;
Assignee:
Levitronix LLC, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H01L 2/164 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H01L 2/164 ;
Abstract
In a process chamber ( ), in which various processing steps in the manufacture of semiconductors can be carried out, there is arranged a rotationally drivable rotary head ( ) which serves as a holder for a substantially disc-shaped object to be processed (W), e.g. for a wafer. Furthermore, at least one applicator ( ) is provided in the process chamber ( ) for the provision of a medium which acts on the object to be processed (W). Means ( ) are arranged radially around the rotary head ( ) for the journalling and for the driving of the rotary head ( ).