The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Jun. 20, 2000
Yoo-hyon Kim, Seoul, KR;
Kwang-jai Yoo, Kyungki-do, KR;
Abstract
Embodiments of the present invention can provide systems, methods and/or computer program products that can obtain an effective pattern density of a layer of an integrated circuit from layout data that defines the layout. A grid of pattern cells is defined for the layout data. A respective pattern density is determined for a respective the pattern cell in the grid. An effective pattern density is calculated for a first pattern cell in the grid. The effective pattern density for the first pattern cell is a function of the pattern density of at least second pattern cell in the grid that is remote from (i.e. nonadjacent) the first pattern cell, and a distance of the at least a second pattern cell from the first pattern cell. Adjacent cells also may be included, and preferably are included, in the effective pattern density.