The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Jun. 07, 2001
Michael L. Wach, Atlanta, GA (US);
Cirrex Corp., Atlanta, GA (US);
Abstract
A system for reducing reflection of an optical system can reduce or eliminate reflection at facets of a semiconductor gain medium and can suppress natural longitudinal modes produced within the semiconductor gain medium. In combination with external feedback, the system can allow more precise wavelength control of the light output of a laser, thereby allowing the laser to be used in a dense wavelength division multiplexing system. The system employs a patterned relief surface disposed on a facet of a gain medium. The patterned relief surface may be a “motheye” pattern having a plurality of conical posts disposed on the surface of the facet. The system may be combined with conventional devices, such as a Bragg reflector or a microelectromechanical component, to further improve wavelength control of a resonant optical cavity, thereby improving the operation of optical communications systems.