The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Jan. 12, 2000
Takeru Matsuoka, Tokyo, JP;
Kazuhiro Tsukamoto, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A lower insulating film is formed so as to cover source/drain regions electrically connected to capacitors. Bit lines and upper insulating layers are formed on the lower insulating film. SCs opening to the lower insulating film are formed by an anisotropic etching process on process conditions for etching the upper insulating films at a high upper insulating film/lower insulating film selectivity. An insulating film of a quality equal to that of the lower insulating film is deposited so as to fill up the SCs and to cover the upper insulating film. The SCs is extended so as to open to the source/drain regions by an anisotropic etching process on process conditions for etching the lower insulating film at a high lower insulating film/silicon film selectivity.