The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Apr. 12, 2001
Applicant:
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/18 ;
U.S. Cl.
CPC ...
C08F 8/18 ;
Abstract
The present invention relates to novel halogenated Wang resins for combinational chemical synthesis, more specifically to halogenated Wang resins expressed by formula (1) useful for the effective tracing of combinational chemical synthetic process on solid supports using X-ray photoelectron spectroscopy (XPS) element analysis method; in formula (1), P represents polystyrene-divinylbenzene; X and Y represent hydrogen atom or halogen atom, which may be identical or different, their total number being 1-4; and at least one of them is halogen atom.