The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Mar. 12, 2002
Kouji Tometsuka, Tokyo, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
An apparatus and a method for manufacturing a semiconductor device can prevent formation of reaction by-products at a cooled metal flange, and can allow a maintenance period of an apparatus to become longer. A vertical CVD apparatus as a substrate processing apparatus for processing substrates W at a prescribed processing temperature comprises an outer reaction quartz tube and an inner reaction quartz tube provided concentrically. The outer tube is vertically disposed via an O-ring on an upper end of a metal flange The inner tube is vertically disposed on an inner wall of the flange The O-ring is cooled via the flange A lower opening of the flange is covered with a furnace opening cover The flange is provided with a gas introducing nozzle to allow a reaction gas to be introduced into the inner tube The outer tube is integrally provided with an exhaust opening so that a high temperature exhaust gas can be exhausted from the exhaust opening before passing through the flange
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile