The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Sep. 23, 1999
Applicant:
Inventors:
Carl A. Gogol, Jr., Manlius, NY (US);
Abdul Wajid, East Syracuse, NY (US);
Gary Rubloff, Ellicott City, MD (US);
Assignee:
Leybold, Inficon, Inc., East Syracuse, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/300 ; G01N 2/902 ;
U.S. Cl.
CPC ...
G01N 3/300 ; G01N 2/902 ;
Abstract
A method of determining the reaction efficiency of a CVD process reactor by which a reactive gas combination entering the reactor deposits a solid reaction product as a thin film onto a substrate. The composition of the reactive gas combination is measured by an acoustic cell which is disposed downstream from the outlet port of the reactor to determine the reactor's efficiency. Determination of the reactor's efficiency allows the growth rate of the thin film to be determined as well as associated rates of the products which have been exhausted from the reactor.