The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Feb. 18, 2000
Applicant:
Inventors:
Donald C. Hofer, Paso Robles, CA (US);
Scott A. MacDonald, San Jose, CA (US);
Arpan P. Mahorowala, White Plains, NY (US);
Robert D. Miller, San Jose, CA (US);
Josef Michl, Boulder, CO (US);
Gregory M. Wallraff, Morgan Hill, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03C 5/16 ; G03C 5/56 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03C 5/16 ; G03C 5/56 ;
Abstract
A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.