The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Dec. 07, 2000
Takeshi Matsunuma, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A first photoresist film with low sensitivity and a second photoresist film with high sensitivity are stacked on an interlayer insulating film formed on a semiconductor substrate (FIGS. A to C). The first and second photoresist films and are exposed simultaneously using a photolithography mask having a first transmittance part corresponding to the contact hole and a second transmittance part corresponding to the upper wiring (FIG. D). They are developed so that the difference in depth between the contact hole and the upper wiring is three-dimensionally reflected in the first and second photoresist films and (FIG. E). Etching is carried out by using them as a mask to form the contact hole and the upper wiring.