The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Oct. 07, 1999
Applicant:
Inventor:
Hidehito Sasaki, Shizuoka, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 ;
U.S. Cl.
CPC ...
B05D 3/12 ;
Abstract
Decrease in sensitivity can be avoided to obtain a stable and highly sensitized photosensitive layer in a process for preparing a photopolymerizing lithographic plate including a coating step and using rubber rollers before and after the coating site. This is achieved by excluding an antioxidant and/or aging retardant from at least the surface of rubber rollers placed before and after the coating site. The photopolymerizing lithographic plate excellent in its sensitivity as compared with the conventional one can be obtained.
Sasaki, Hidehito. (2002). Method for producing a photopolymerizing lithographic plate including coating and conveying a web using rubber rollers before and after the coating step (U.S. Patent No. 6482472). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6482472
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile