The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2002
Filed:
Jun. 13, 2000
Werner Straub, Oberstammheim, CH;
Christoph Sprecher, Davos Dorf, CH;
John Antony Peters, Winterthur, CH;
Markus Windler, Hofstetten, CH;
Sulzer Innotec AG, Winterthur, CH;
Abstract
In the method for producing a surface structure, material is ablated by means of a liquid jet ( ). The jet ( ) is emitted from a nozzle ( ) under high pressure (p). In this an ablation location ( ) is controlledly moved on a surface ( ) of a substrate ( ) to be structured with the production of a predetermined macro-topography ( ′) or a largely planar surface, namely through moving the nozzle and/or the substrate. The substrate is in particular part of a surgical implant. The liquid of the high pressure jet ( ) is emitted at a predetermined diameter d of the nozzle with a sufficiently high pressure p so that through the material ablation a linear track ( ) with quasi-fractal micro-topography ( ) is produced. In this the track width D is at least twice as large as d. Values for p and d are provided in the following range: 100 bar<p<3000 bar and 0.1 mm<d<10 mm; or p>3000 bar and d>0.03 mm.