The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2002
Filed:
Jun. 12, 2001
Ryoichi Inanami, Kawasaki, JP;
Shunko Magoshi, Yokohama, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A charged-particle beam exposure system includes a charged-particle beam exposure apparatus for forming a pattern on a sample by charged-particle beam exposure using both a character projection exposure method and a variable shaped beam exposure method, a standard cell library which stores information of a plurality of standard cells that optimize circuit patterns for function units, an aperture mask which is set in the charged-particle beam exposure apparatus, bears characters corresponding to the standard cells, and has an aperture block falling within the irradiation range of the charged-particle beam exposure apparatus, a CP aperture mask management table which stores an index unique to each aperture block that is formed on the aperture mask and bears the characters corresponding to the standard cells, information of the standard cells corresponding to the characters laid out on each aperture block, and the number of charged-particle beam shots necessary to expose all the characters corresponding to the standard cells by the character projection exposure method, and a design unit for designing a layout by looking up the standard cell library and the CP aperture mask management table.