The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2002
Filed:
Jan. 29, 2001
Applicant:
Inventor:
Tadashi Narita, Tokyo, JP;
Assignee:
Oki Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 3/126 ; H01L 2/14763 ; B24B 1/00 ;
U.S. Cl.
CPC ...
G01R 3/126 ; H01L 2/14763 ; B24B 1/00 ;
Abstract
An evaluating pattern includes conductive pattern which has a rectangular configuration, an insulating layer which is formed on the conductive pattern, and a conductive material filled into contact holes which is formed in the insulating layer on the middle of the conductive pattern.
Narita, Tadashi. (2002). Evaluating pattern for measuring an erosion of a semiconductor wafer polished by a chemical mechanical polishing (U.S. Patent No. 6480017). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6480017
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile