The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2002

Filed:

Feb. 28, 2001
Applicant:
Inventors:

Hitoshi Ohmori, Wako, JP;

Noboru Ebizuka, Mitaka, JP;

Yutaka Yamagata, Wako, JP;

Shinya Morita, Tokyo, JP;

Sei Moriyasu, Tokyo, JP;

Muneaki Asami, Tokyo, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; B24B 4/900 ;
U.S. Cl.
CPC ...
B24B 1/00 ; B24B 4/900 ;
Abstract

A voltage is applied between a cylindrical cutting grindstone that rotates about a vertical axis Y and a cylindrical truing grindstone that rotates about a horizontal axis X. The vertical outer surface and the horizontal lower surface of the cutting grindstone are trued by a plasma discharge. Then without applying the voltage, the cutting grindstone is trued mechanically by the truing grindstone , and while the outer periphery and lower surface of the cutting grindstone are dressed electrolytically, the outer periphery and lower surface are made to contact a workpiece and process a micro-V groove. This method makes it possible to produce an immersion grating with a high resolution using hard, brittle materials such as germanium, gallium arsenide and lithium niobate.


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