The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2002

Filed:

Jul. 07, 2000
Applicant:
Inventors:

Junichi Shimizu, Tokyo, JP;

Yuji Furushima, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/035 ;
U.S. Cl.
CPC ...
G02F 1/035 ;
Abstract

An impurity diffusion preventing layer is provided between a first upper clad layer adjacent to an optical absorption layer and a second upper clad layer provided on the first upper clad layer in order to prevent p type impurity from diffusing to the first upper clad layer adjacent to the optical absorption layer.


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