The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2002

Filed:

Aug. 29, 2000
Applicant:
Inventors:

Alexander M. Shukh, Savage, MN (US);

Edward S. Murdock, Edina, MN (US);

Steven A. Mastain, Chanhassen, MN (US);

James K. Price, Tonka Bay, MN (US);

Assignee:

Seagate Technology LLC, Scotts Valley, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/147 ;
U.S. Cl.
CPC ...
G11B 5/147 ;
Abstract

A magnetic recording head having an air bearing surface comprises a writer having a substantially planar single piece top pole, a shared pole and a conductive coil. The top pole and shared pole are separated by a write gap region. A magnetic stud is positioned adjacent the write gap region near the air bearing surface. The magnetic stud provides a uniform magnetic flux supply to the write gap region. The magnetic stud has a variable height along the air bearing surface. An inner surface of the magnetic stud substantially conforms to an outer surface of the conductive coil. The shared pole includes a recess, and at least a portion of the conductive coil is positioned in the recess. The recess in the shared pole is filled with an insulator that substantially surrounds the portion of the conductive coil positioned in the recess. A capping layer is formed on the portion of the conductive coil positioned in the recess. The shared pole includes a common top surface comprising a top surface of the magnetic stud, a top surface of the insulator and a top surface of the capping layer. The common top surface is made substantially planar by chemical-mechanical polishing.


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