The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Jul. 19, 2001
Tanaka Kikinzoku Kogyo K.K., Tokyo, JP;
Abstract
The disclosed is a method of producing two organic ruthenium compounds; i.e., bis(ethylcyclopentadienyl)ruthenium and (alkylcyclopentadienyl)cyclopentadienylruthenium, which are useful for producing thin film through CVD. In one aspect, the invention provides a method for producing bis(ethylcyclopentadienyl)ruthenium, including hydrogenating bis(acetylcyclopentadienyl)ruthenium in the presence of a catalyst. In another aspect, the invention provides a method of producing (alkylcyclopentadienyl)cyclopentadienylruthenium, including acylating bis(cyclopentadienyl)ruthenium with carboxylic anhydride in the presence of phosphoric acid as a catalyst, to thereby produce (acylcyclopentadienyl)cyclopentadienylruthenium, and reducing the (acylcyclopentadienyl)cyclopentadienyl ruthenium.