The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2002

Filed:

Aug. 10, 2000
Applicant:
Inventor:

Koichi Ando, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract

Field effect transistors of an integrated circuit are fabricated on a silicon substrate, and require gate insulating layers appropriate for the purpose of individual component circuits, the active areas assigned the field effect transistors are sequentially exposed to source gas varied in the ratio between oxygen and nitrogen for growing silicon oxide and/or silicon oxynitride thereon, and the nitrogen serves as a diffusion inhibitor against the oxygen so as to form the gate insulating layers different in thickness of the order of several angstroms.


Find Patent Forward Citations

Ando, Koichi. (2002). Semiconductor device having gate insulating layers different in thickness and material and process for fabrication thereof (U.S. Patent No. 6475862). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6475862

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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