The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Aug. 26, 1999
Kunihiko Mori, Yokosuka, JP;
Yoshitada Katagiri, Tokyo, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Abstract
A method for manufacturing an optical filter capable of manufacturing an optical filter in such a manner that the transmission wavelength varies linearly with respect to the angle &thgr; in the rotation direction of the substrate and that almost the entire range of the angle &thgr; is utilizable as the optical filter. A mask capable of being rotated relatively with respect to the substrate coaxially on a plane parallel to the substrate, which is either having an aperture extending along a radius direction with an aperture angle &phgr; or itself extending along a radius direction to cover an angle &phgr;, is provided over the substrate. Then, the mask is relatively rotated with respect to the substrate at least once at a non-constant angular speed during a formation of a single layer or multiple layers on the substrate, while depositing a dielectric material in a single layer or multiple layers on the substrate from the mask side within a deposition chamber.