The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Mar. 02, 2001
Applicant:
Inventors:
Terry V. Nordstrom, Corvallis, OR (US);
Timothy R. Emery, Corvallis, OR (US);
Sadiq Bengali, Corvallis, OR (US);
Victorio A. Chavarria, Corvallis, OR (US);
Michael G. Monroe, Corvallis, OR (US);
George Radominski, Corvallis, OR (US);
Assignee:
Hewlett-Packard Company, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/16 ;
U.S. Cl.
CPC ...
B41J 2/16 ;
Abstract
An ink-jet printhead fabrication process and product that uses selectivity rate controlled etch techniques to produce trenches on the frontside of a silicon substrate to define ink feed channels and resistor support regions. Location and size of features is made independent of etch rate by providing a selective etch for the silicon trench etch steps that is greater than 10,000:1 for the silicon:oxide that defines ink feed channels and resistor support areas.