The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Oct. 27, 2000
Applicant:
Inventors:
Assignee:
Nippon Sanso Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 3/004 ; B01D 5/302 ;
U.S. Cl.
CPC ...
G01N 3/004 ; B01D 5/302 ;
Abstract
There are provided a method and an apparatus capable of accurately analyzing impurity component having high adsorptivity or reactivity in a short time. Prior to starting measurement, predetermined amount of sample gas is introduced into analyzing system in plural times with predetermined time interval and then, analysis of impurities is started.
Nishina, Akira. (2002). Method and apparatus for analyzing impurities in gases (U.S. Patent No. 6474136). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6474136
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile