The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Mar. 08, 2001
Applicant:
Inventor:
Wenhui Mei, Plano, TX (US);
Assignee:
Ball Semiconductor, Inc., Allen, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/710 ; G02B 2/608 ; G03B 2/742 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G02B 2/710 ; G02B 2/608 ; G03B 2/742 ; G03F 9/00 ;
Abstract
A system for performing digital lithography onto a subject is provided. The system includes a noncoherent light source for producing a first light and an optical diffraction element for individually focusing the first light into a plurality of second lights. The system also includes a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights. A lens system may then direct the digital pattern to the subject, thereby enabling the lithography.