The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Jan. 05, 2001
Applicant:
Inventor:
Guangming Xiao, Austin, TX (US);
Assignee:
Photronics, Inc., Brookfield, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/3544 ;
U.S. Cl.
CPC ...
H01L 2/3544 ;
Abstract
A step mask having a plurality of test cells and a method for producing the same. Each test cell of the step mask is etched for a different amount of time and therefore has a different etch depth or height. The number of phase shifter layer etch iterations can be conducted on a column-by-column and row-by-row basis to decrease the number of etch iterations.