The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Nov. 12, 1998
Applicant:
Inventors:
Minoru Otani, Tokyo, JP;
Kenji Ando, Kawasaki, JP;
Yasuyuki Suzuki, Yokohama, JP;
Ryuji Biro, Kawasaki, JP;
Hidehiro Kanazawa, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 9/00 ; B32B 1/900 ;
U.S. Cl.
CPC ...
B32B 9/00 ; B32B 1/900 ;
Abstract
In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al O for high-index layers and AlF or MgF for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.