The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Jun. 20, 2000
Misao Kusunoki, Kanagawa, JP;
Tomikazu Watanabe, Tokyo, JP;
Shigehide Yamamichi, Kanagawa, JP;
Masafumi Ata, Kanagawa, JP;
Shinichi Mizuno, Kanagawa, JP;
Matthias Ramm, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A photocatalyst having superior durability; a manufacturing method for the photocatalyst and a method and apparatus for decomposing a gas, where a film which is fullerene-based but different from the evaporated fullerene film is used. The photocatalyst has a fullerene polymer film layered on a substrate. There may be carried fine metal particles on the fullerene polymer film. These fine metal particles are carried by sputtering, evaporation or coating on the fullerene polymer film. The apparatus for decomposing the gas includes a light source and a fullerene polymer film. In effecting gas decomposition, the gas to be processed is contacted with the fullerene polymer film under light illumination.