The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2002

Filed:

Nov. 09, 1999
Applicant:
Inventor:

David Noblett, Oak Park, CA (US);

Assignee:

Packard Instrument Company, Meriden, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/164 ;
U.S. Cl.
CPC ...
G01N 2/164 ;
Abstract

A microarray scanning system for conducting microarray experiments on a planar substrate includes an excitation radiation source, a detection system, and a computational device, the planar substrate supporting a plurality of dilution marks containing a fluorophore and located on the substrate surface at predetermined distances from a fiduciual reference mark and/or a microarray. Automatic calibration adjustment of either or both the detection system and the excitation radiation source is achieved via the computational device by irradiating the dilution spots, detecting emission radiation produced by the dilution spot fluorophore material, deriving a series of brightness readings from the levels of emission radiation detected at corresponding dilution spots; analyzing the brightness readings to obtain a fluorophore brightness characteristic as a function of concentration; and adjusting the sensitivity of the detection system and/or the intensity level of the source of excitation radiation in accordance with the fluorophore brightness characteristic.


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