The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Feb. 27, 2001
Ramesh Jagannathan, Rochester, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Suresh Sunderrajan, Rochester, NY (US);
John E. Rueping, Spencerport, NY (US);
Gary E. Merz, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An apparatus and method of focusing a functional material is provided. The apparatus includes a pressurized source of fluid in a thermodynamically stable mixture with a functional material. A discharge device having an inlet and an outlet is connected to the pressurized source at the inlet. The discharge device is shaped to produce a collimated beam of functional material, where the fluid is in a gaseous state at a location before or beyond the outlet of the discharge device. The fluid can be one of a compressed liquid and a supercritical fluid. The thermodynamically stable mixture includes one of the functional material being dispersed in the fluid and the functional material being dissolved in the fluid.