The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Apr. 03, 2001
Applicant:
Inventors:
Hiromu Ishii, Kanagawa, JP;
Shouji Yagi, Kanagawa, JP;
Katsuyuki Machida, Kanagawa, JP;
Kunio Saito, Kanagawa, JP;
Tadao Nagatsuma, Kanagawa, JP;
Hakaru Kyuragi, Tokyo, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04L 2/14763 ;
U.S. Cl.
CPC ...
H04L 2/14763 ;
Abstract
In a pattern forming method, a trench is formed on a flat base. A pattern material is arranged only in and around the trench so as to project upward from the surface of the base and to be larger than the opening of the trench. The pattern material projecting from the surface of the base is removed by chemical mechanical polishing (CMP) so as to be flush with the upper surface of the base.