The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2002

Filed:

Feb. 27, 2001
Applicant:
Inventors:

John Petruzzello, Carmel, NY (US);

Theodore James Letavic, Putnam Valley, NY (US);

Mark Simpson, White Plains, NY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ; H01L 2/1331 ; H01L 2/18222 ; H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/176 ; H01L 2/1331 ; H01L 2/18222 ; H01L 2/100 ;
Abstract

An improved method and structure for a transistor device with a lateral drift region and a conducting top field plate is presented. The method consists of decreasing the gate to drain capacitance by means of decreasing the portion of the field plate that is connected to the gate electrode, and hence the effective overlap of the gate with the drift region and drain. This results in decreased energy dissipation in switching the transistor, and more efficient operation. The rate of decrease of the gate to drain capacitance is even faster at higher drain voltages, inuring in significant energy efficiencies in high voltage applications.


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