The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Feb. 04, 2002
Susumu Yoshida, Kawasaki, JP;
Yuichiro Itai, Kawasaki, JP;
Yoshiharu Kasamatsu, Kawasaki, JP;
Toshiro Takahashi, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method of texturing includes the process of enhancing the hydrophilicity on the surface of a substrate for a recording medium. A texture is then formed on the surface of the substrate with an aqueous slurry in which abrasive grains are dispersed. The surface of the substrate is expected to exhibit an enhanced property of wetness to the aqueous slurry. The aqueous slurry easily spreads over and contacts the surface of the substrate even from the initial stage of the process. The abrasive grains in the aqueous slurry are allowed to uniformly spread over the surface of the substrate. Establishment of the texture can be started on the surface of the substrate at an earlier stage of the process. Even with the abrasive grains of a smaller grain size, a fine and uniform texture of a predetermined surface roughness can be established on the surface of the substrate within a shortened period. Increase in the operating period of abrasion can remarkably be suppressed irrespective of the reduced size of the abrasive grains.