The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Apr. 13, 2001
Applicant:
Inventor:
Naoki Kusunoki, Tokyo, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G06G 7/48 ;
U.S. Cl.
CPC ...
G06G 7/48 ;
Abstract
A simulation method simulates a self-aligned silicide (SALICIDE) process according to heat treatment temperature and changes in the composition of a silicide film during first and second heat treatments. The simulation method separately simulates silicide reactions in the first and second heat treatments according to species (metal or silicon) diffusing through a silicide, to thereby improve the accuracy of simulations.
Kusunoki, Naoki. (2002). Semiconductor device simulation method, semiconductor device simulator, computer program for semiconductor device simulation, and method of manufacturing the semiconductor device (U.S. Patent No. 6467066). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6467066
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile