The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2002

Filed:

Jun. 09, 2000
Applicant:
Inventor:

Jae-Won Kim, Tangjong-Myon, Asan-City, Chungchongnam-Do 336-840, KR;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/500 ;
U.S. Cl.
CPC ...
G06F 1/500 ;
Abstract

A performance analysis method for a centrifugal impeller adapter to simplify performance analysis of an impeller and to obtain an accurate calculation result in comparison with analysis by way of averaging the entire flow of the centrifugal impeller. The method for measuring a flow field at an impeller exit analyzes an exit flow angle, total pressure ratio and efficiency, to enable analysis of the performance of the manufactured centrifugal impeller, wherein the flow field of the centrifugal impeller at the impeller exit is dualized into a jet region flow field and a wake region flow field, by which each flow field is sought and averaged to obtain the flow field.


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Kim, Jae-Won. (2002). Performance analysis method of centrifugal impeller (U.S. Patent No. 6466896). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6466896

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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