The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
May. 13, 1999
Akio Aoki, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In a semiconductor exposure apparatus, when a trouble such as a wafer chuck error which requires operator's action in the chamber occurs, execution or interruption of the exposure sequence is determined on the basis of the situation of the exposure sequence, and unlock of the door of the chamber is controlled on the basis of the determination result. After the error is eliminated, lock of the door is controlled, and the exposure sequence is resumed. By eliminating human factors in operation and making the time required for restoration as short as possible, the interruption time of the semiconductor exposure apparatus is minimized to improve the operation efficiency of the manufacturing line.