The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Apr. 27, 1999
Applicant:
Inventors:
Masaaki Kurihara, Tokyo, JP;
Toshikazu Segawa, Tokyo, JP;
Tetsuro Komukai, Tokyo, JP;
Masataka Nakazawa, Tokyo, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/34 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G02B 6/34 ; G03F 9/00 ;
Abstract
The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage with a phase mask blank placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves or strips in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams , whereby the entire area of the phase mask blank to be written is continuously written.