The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Apr. 23, 2001
Hiroshi Sunagawa, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The multi-beam exposure apparatus includes a light source for emitting a specified number of multi-beams spaced apart in a direction of auxiliary scanning, a deflecting unit for deflecting the specified number of multi-beams collectively on main scanning lines by a specified number of deflections such that a space between adjacent ones of the specified number of multi-beams is exposed and a main scanning unit for performing main scan of a recording material as it is exposed with the specified number of multi-beams, wherein the space between adjacent ones of the specified number of multi-beams is an integral multiple of (the specified number of deflections +1) multiplied by a pitch of pixels in the direction of auxiliary scanning.